EUVA official Web site / News from EUVA

50^th EUVA Newsletter
EUVA Newsletter vol. 50 was circulated and uploaded on the EUVA Community site. This issue highlights the 2010 MIRAI Project Report held in Tsukuba, which is the final report on 10 year MIRAI Project. In the report, EUVA presented the development of LPP and DPP EUV sources. It gathered 498 attendees. This issue also includes detailed reports on the 2010 EUVL Symposium at Kobe. Other topics are; NMC 2010, Lithography workshop in Hawaii, Canon Expo 2010 and a visit report by research association group. The program of EUVA report to be held on 18 March is announced and registration is accepted at info{at}euva.or.jp.

49^th EUVA Newsletter
EUVA Newsletter vol. 49 was circulated and uploaded on the EUVA Community site. This issue highlights the prompt report on 2010 EUVL Symposium held in Kobe Japan. It gathered 443 attendees, which recorded the second largest number after Sapporo. MNE 2010, SEMATECH Symposium, and University Hyogo EUVL Symposium are reported. Also this newsletter reports the lecture meeting on "R&D by manufacturers and IPR" presented by Professor Giichi Marushima, patent attorney. This issue consists of unusually 12 pages!!

48^th EUVA Newsletter
EUVA Newsletter vol. 48 was circulated and uploaded on the EUVA Community site. This issue highlights the report on a visit to EUVA German branch. DPP development is mainly undertaken at German branch at Aachen. This visit is to inspect research equipments, and to request the accountant office to accelerate VAT refund process. Other topics are: NGL-WS report, International Development Society conference, PV-Japan report, and Fujikin symposium.

47^th EUVA Newsletter
EUVA Newsletter vol. 47 was circulated and uploaded on the EUVA Community site. This issue highlights several reports on symposia or conferences: SEMATECH Litho Forum held in NY, USA, EIPBN in Anchorage, Alaska, Selete Symposium in Tsukuba, SEAJ spring lecture in Tokyo, and VLSI-TSA in Taiwan. EUVA's activities, technological exchange meeting at Hiratsuka and general meeting, are also reported.

46^th EUVA Newsletter
EUVA Newsletter vol. 46 was circulated and uploaded on the EUVA Community site. This issue highlights the report on EUVA Source development in Fy2009 held at Miraikan and the detailed report on 2010 SPIE Advanced Lithography held at San Jose. Also the issue conveys IMS Technology Report by IMS Center and Advanced Technology Seminar by University of Hyogo.

45^th EUVA Newsletter
EUVA Newsletter vol. 45 was circulated and uploaded on the EUVA Community site.
This issue highlights the report on SPIE Advanced Lithography Symposium at San Jose, USA. It also reports on the visit to Miyako Island, which is promoting new energy development including "smart grid." Other topics are: METI's budget plan for FY2010, and EUVA board meeting, and EUV source evaluation committee.

44^th EUVA Newsletter
EUVA Newsletter vol. 44 was circulated and uploaded on the EUVA Community site. This issue highlights the report on MIRAI Project. The report was held on 16 December in Tsukuba, and gathered about 530 attendees. EUVA presented its R&D activities on the high reliability EUV source as a member of MIRAI Project. A second topic is a detailed report on 2009 EUVL Symposium held in Plague, including LPP and DPP development in EUVA.

43^rd EUVA Newsletter
EUVA Newsletter vol. 43 was circulated and uploaded on the EUVA Community site. This issue highlights the report on the 2009 EUVL Symposium held in Prague, Czech, from 18 to 22 October. Several presentations have indicated that EUVL is approaching to manufacturing use. Other topics are; report on IEUVI (International EUV Initiative) meeting, SEMATECH Symposium Japan, and a lecture by lawyer Date on the patent law and ex officio invention.

42^nd EUVA Newsletter
EUVA Newsletter vol. 42 was circulated and uploaded on the EUVA Community site. This issue highlights the report on the newly opened EUVA branches in Oyama and Germany. Oyama branch is located at Gigaphoton and German branch at Xtreme. Other topics are; Lithography Workshop 2009 held at Coeur d'Alene, Idaho, NGL Workshop 2009 in Tokyo, SPIE Optics & Photonics at San Diego, and visiting report on the Numadu facility of Fijitsu.

41^st EUVA Newsletter
EUVA Newsletter vol. 41 was circulated and uploaded on the EUVA Community site. This issue highlights the report on EUVA research results in FY2008, held on 12 June at Nihon Kagakukan. Other topics are; Photo Mask Japan, Researcher's report in Germany, and NEDO research joint meeting by Hiratsuka and Gotemba.

40^th EUVA Newsletter
EUVA Newsletter vol. 40 was circulated and uploaded on the EUVA Community site. This issue highlights the report on SPIE Advanced Lithography 2009. The conference was held from 22 to 27 February at the San Jose convention Center. The conference suffered 38% decrease of attendees, however, EUVL section attracted more attendees than last year. IEUVI, held in conjunction with the conference, was also reported. Other topics are; Joint meeting for NEDO research and 31^st Board of Director meeting.

39^th EUVA Newsletter
EUVA Newsletter vol. 39 was circulated and uploaded on the EUVA Community site. This issue highlights two visit reports. One is the University of Illinois at Urbana-Champaign. EUVA has contracted a part of the research of "Development of High Reliability EUV source" with UIUC. Dr. Hotta, head of Gotemba research center, EUVA, reported the activities by Professor Ruzic and his colleagues. Another visit is reported by Dr. Kasama, head of research department, EUVA Head office, on the research activities at Xtreme and Philips EUV.

38^th EUVA Newsletter
EUVA Newsletter vol. 38 was circulated and uploaded on the EUVA Community site. This issue highlights the report on MIRAI Project which has started the second phase in the third term. The report was held in Tsukuba, gathered about 500 attendees. This was the first time for EUVA to present its R&D activity as a member of MIRAI Project.A second topic is a report of site-visit by members of association group of technology development. The group visited Niigata, including Katakai-Enka (fireworks factory), petro company , Sake (Japanese wine brewer), and Nagaoka University of Technology.

37^th EUVA Newsletter
EUVA Newsletter vol. 37 was circulated and uploaded on the EUVA Community site. This issue highlights the report on the EUVL Symposium held from 29 September to 1 October at Lake Tahoe, USA. The report on the IEUVI meeting held in conjunction with the symposium is included in this issue. The Industrial Strategy and Technology Forum 2008 held on 16 September at Pacifico Yokohama is also reported.

36^th EUVA Newsletter
EUVA Newsletter vol. 36 was circulated and uploaded on the EUVA Community site. This issue highlights the final report on Leading Project by MEXT, from 2003 to 2008 and an interview with Mr. Masashiro Sakane. Mr. Sakane, Chairman of the Board of Komatsu, was elected President of EUVA and he made clear his management style and personal taste.
Other topics of this issue are: Report on the Workshop Next Generation Lithography 2008 and site visits to CASMAT and Kameyama factory of Sharp.

35^th EUVA Newsletter
EUVA Newsletter vol. 35 was circulated and uploaded on the EUVA Community site. This issue highlights the report on EUVL development in FY2007, held on 16 May at Kokuyo Hall. The EUVL report included the results of EUVA project and EUV mask project at Selete and a brief report from Leading Project by MEXT. Following the EUVL report, the report of Leading Project was held on 15 May. Both EUVA project and LP finished their R&D in FY 2007 and produced excellent results.
Other topics in this issue are; EUV Source Workshop/ Litho Forum at Bolton Landing in NY, 2008 International Workshop on EUV Lithography at Hawaii, and SPIE High-power Laser Ablation 2008 in New Mexico, USA.

34^th EUVA Newsletter
EUVA Newsletter vol. 34 was circulated and uploaded on the EUVA Community site. This issue reports the new EUVA project focused on EUV source development. EUVA project has finished in March 2008 and EUVA is applying a three year plan to NEDO, developing the technology of high reliability EUV source. EUVA will also develop prototype of high power source using EUVA's self funding. In line with the new projects, EUVA has refurbished its organizational structure.
Other topics of this issue are the reports on SPIE 2008 and IEUVI at San Jose, and Applied Physics conference in the spring 2008.

33^rd EUVA Newsletter
EUVA Newsletter vol. 33 was circulated and uploaded on the EUVA Community site. This issue reports the site visit to Gotemba Branch by EUVA people. EUVA Gotemba has developed a EUV SoCoMo (Source Collector Module) to prove 50W IF power.
Joint meeting of EUVA source TWG and EUV Source development technology committee for Leading Project was held on February 1 and 2 at Toray Mishima Training Center.
62 researchers joined the meeting and discussed EUV source development. This meeting is the final one for both EUVA project and Leading Project.
Other topics are; report on the Photonics West 2008, and visiting report at Nagasaki Ship Building Yard by association group.

32^nd EUVA Newsletter
EUVA Newsletter vol. 32 was circulated and uploaded on the EUVA Community site. This issue reports the 2007 EUVL Symposium held in Sapporo from 29 to 31 October. 501 attendees gathered at the symposium, and the number is a record high. The critical issues voted by the steering committee members are the same as those at 2006 symposium, in order and items. EUV high power source is the highest ranking. Other topics in this issue are; report on IEVI meeting, Lithography Workshop at Puerto Rico, and other conferences.

31^st EUVA Newsletter
EUVA Newsletter vol. 31 was circulated and uploaded on the EUVA Community site. This issue highlights the press site tour to Utsunomiya R&D Center of EUVA located at Canon Utsunomiya. Six persons from the press joined the tour. Utsunomiya R&D Center is developing tool technologies, in particular processing/measurement of mirror and contamination control. The participants were impressed by the sub-nm level technology being developed in the clean room.
This issue also reports on SPIE Optics & Photonics, The Academy of Applied Physics conference.

30^th EUVA Newsletter
EUVA Newsletter vol. 30 was circulated and uploaded on the EUVA Community site. This issue highlights the successful data acquisition of wave front measurement on the full field EUV projection optics. EWMS (EUV Wave-front Metrology System) was completed and EUVA carried out an experiment at NEW Subaru of Hyogo University and obtained first data of interference pattern by DTI method.
This issue also reports on NGL 2007, IEEE Pulsed Power and Plasma Science Conference 2007.

29^th EUVA Newsletter
EUVA Newsletter vol. 29 was published and uploaded on the EUVA Community site. This issue highlights the reports on the FY2006 research results by EUVA, Leading Project, ASET and Selete, with gathering over 250 people. The keynote speech was addressed by Dr. Junji Ito, Director of Research and Innovation Promotion Office at AIST, titled "Semiconductor Industry and Innovation." The presentation paper is open on this web site. Other topics are; report of Source Workshop at Baltimore, Selete Symposium 2007, and Leading Project by MEXT. Good news is 26nm patterning was achieved by SFET at Selete, using EUV source and two-mirror projection optics supplied by EUVA, which is publicized by NEDO on 30 May.

28^th EUVA Newsletter
EUVA Newsletter vol. 28 was published and uploaded on the EUVA Community site. This issue reports on the intensive two-day discussion on the development of EUV source held at Toray Training Center in Mishima. 71 people from EUVA, Leading Project and tool makers lodged there and discussed the progress and problems for commercialization of EUV source. Other topics are reports on SPIE advanced Lithography, Applied Physics Society of Japan and EUV research results by ASET. The Research Association Gathering exchanged opinions at a regular meeting on the revised research Association Law and Regulations which would affect the existing article of a research association.

EUVA has launched the page of 2007 EUVL Symposium in Japanese on 9 March on this EUVA site.

27^th EUVA Newsletter
EUVA Newsletter, 27^th edition was completed and published on "Information Warehouse for all" in the EUVA Community site. The front page topic is that IBF(Ion Beam Figuring) has successfully reached its goal and will soon be used for production. Professor Toyoda, EUVA's source project leader, wrote the history of EUV source development for the EUVA newsletter. The report of Photonics West 2007 is included in this issue as well. The body of the newsletter is posted on the "Information Warehouse for all" in the EUVA Community Site.

26^th EUVA Newsletter
26^th EUVA Newsletter is circulated and published on "Information Warehouse for all" in the EUVA Community site. This issue highlights the start of experiment of Absolute Wave-front measurement system at Subaru SOR in Hyogo. The measurement results are expected in the early of 2007. Other topics are; the report of Optics Photonics Japan 2006, and the seminar of IPR by Mr. Kato, Fujitsu Ltd., and the report of the regular meeting of Technology Association Group held in Sapporo.

25^th EUVA Newsletter
25^th EUVA Newsletter is circulated and published on "Information Warehouse for all" in the EUVA Community site. This issue highlights the first exposure results of SFET. It has proved excellent performance on basic aberration and flare. 32nm L&S resolution was obtained by SFET. Other topics are ; report of EUVL Symposium held in Barcelona, and IEUVI meeting. At EUVL Symposium in Barcelona, Professor Horiike, Project Leader of EUVA, announced that the 6^th EUVL Symposium would be held in Sapporo, Hokkaido Japan.

24^th EUVA Newsletter
24^th EUVA Newsletter is circulated and published on "Information Warehouse for all" in the EUVA Community site. This issue highlights the completion of LPP SFET source and its integration with two-mirror projection optics at Utsunomiya Canon site. The experiment of exposure will be done by October. Other topics are reports from meetings at Laser Society of Japan, and the Institute of Electrical Engineers of Japan. EUVA organized the annual press tour to Osaka University to introduce Leading Project by MEXT, which is promoting EUV source research in close cooperation with EUVA.

23^rd EUVA Newsletter
EUVA Newsletter of 23^rd edition was circulated and published in the EUVA Website. This issue highlights the EUVL Report on the research results in 2005. EUVL Report was held on 13 June at Kokuyo Hall near JR Shinagawa Station. It gathered over 300 people from universities, consortia, manufacturers, and media. The report of Leading Project by MEXT was held one day before, 12 June at Nihon Mirai Kagakukan.
Other topics in this issue are; report on the Lithography Forum held by SEMATECH in Vancouver, and SELETE Symposium held at Pacifico Yokohama on 30 May.
The headquarters of EUVA has moved from Kanda in Tokyo to Kawasaki after 19 June.

22^nd EUVA Newsletter
22^nd is circulated and published on "Information Warehouse for all" in the EUVA Community site. This issue highlights the reception to introduce the EUV Wave Front Measurement System completed at the NewSubaru of Hyogo University. Meeting reports are SPIE Microlithography, IEUVI and the Academy of Applied Physics. SFET(Small Field Exposure Tool) is under developing and reported on its progress, as well.
If you would like to subscribe EUVA Newsletter by e-mail, please contact info@euva.or.jp

21^st EUVA Newsletter
21^st EUVA Newsletter is circulated and published on "Information Warehouse for all" in the EUVA Community site. This issue highlights the interview with Mr. Shunichi Uzawa, Director of Core Technology Development Headquarters, Canon. He expressed strong commitment for the EUVL development. EUVA organized the third all-night discussion on EUV light source, which had been held as an annual event in Mishima city, Shizuoka. 72 professors and researchers from EUVA and Leading Project joined the discussion. Other topic is the report of Photonics West 2006 held at San Jose Convention Center.
If you would like to subscribe EUVA Newsletter by e-mail, please contact info@euva.or.jp

20^th EUVA Newsletter
20^th EUVA Newsletter is circulated and published on "Information Warehouse for all" in the EUVA Community site. This issue highlights the report on the experiment result of DPP light source. We have achieved 397W/2π with SnH4 gas, which is equivalent of 33W at Intermediate Focus. We are confident 50W prototype source is coming into view. Another topic is the report of 4^th International EUVL Symposium held at San Diego in California, USA. Critical Issues for HVM were revisited and resist sensitivity was emerged as the top issue. The source power for HVM stipulated in the Joint Requirement was revised from 115W to >115W accordingly. EUVA Project was evaluated and highly ranked "A," second from "S," by Council for Science and Technology, which is an advisory committee for Minister of State for Science and Technology Policy.

19^th EUVA Newsletter (October 2005)
19^th EUVA Newsletter is circulated and published on "Information Warehouse for all" in the EUVA Community site. This issue highlights the report of the experiment of LPP light source exited by CO2 laser at BNL in USA.. We have confirmed CE2.5% with Zn target plate. Another topic is the report of interview with Mr. Kariya, President of Nikon, and you can find a lot of interesting talk with him.

18^th EUVA Newsletter (August 2005)
18^th EUVA Newsletter is circulated and published on "Information warehouse for all" in the EUVA Community site. This issue highlights the report of the workshop on EUVL development under the ISTC (International Science and Technology Center). ISTC is an international organization established to offer the opportunity to Russian researchers to redirect their research from military use to civilian use. Since EUVL #911 project will be completed by September 2005, roundup meeting was held at St. Petersburg in Russia. This issue also include NGL workshop in Tokyo, VNL activity report at UC Barkley, and SPIE Annual Meeting at San Diego. One of the presidents of EUVA has been transferred from Shoichiro Yoshida to Michio Kariya, President of Nikon Corporation.

Third EUVA site tour for media
EUVA organized the third EUVA site tour for news media people on 8 July 2005. Four presses joined the tour to the University of Hyogo, where EUVA has facilities for development of wave front measurement and contamination control technology. To measure characteristics of six-mirror projection optics, EUV light from NEW SUBARU of the University of Hyogo is used. Now two-mirror optics is under testing until the introduction of six-mirror measurement system in September. Press people asked many in-depth technical questions at the site.
They also visited the laboratory of Prof. Mochizuki, who had been eagerly seeking the possibility of rotating cryogenic Xe target for LPP. They observed rotating target emitting EUV light at the laboratory.
You may find the tour report on; MYCOM PC WEB, Dempa Shinbun Daily, Electronic Journal, and the Semiconductor Industry News.

17^th EUVA Newsletter (June 2005)
17^th EUVA Newsletter is circulated to interested people and published on "Information warehouse for all" in the EUVA Community site. This issue highlights the report of EUVA R&D in 2004 held on 7 June 2005 at Kokuyo Hall in Tokyo. Two key note addresses and ten technical results were reported to 300 attendees. The report of Leading Project by MEXT was held on the following day of 8 June at Gakushikaikan in Tokyo. It has publicized excellent research results on spectrum analysis and precise calculation of conversion efficiency. Other topics are reports on EIPBN 2005 at Florida, and Laser 2005 in Munich, Germany. We are pleased to announce that EUVA project has got a high marks on its interim evaluation by NEDO committee.

Invitation to the third EUVA Site Tour for the media.
We are pleased to invite media people to the third EUVA Site tour. This time we will open the experiment facility for absolute wave front measurement at SUBARU SOR of Hyogo University. The R&D program for absolute wave front measurement will be completed in March 2006, and this is the last chance to look over the experiment equipment.
In conjunction with the wave front measurement, Professor Takayasu Mochizuki at Laboratory of Advanced Science and Technology for Industry, Hyogo University, has kindly offered to open his laboratory. He is developing EUV light source in particular LPP target using cryogenic Xe.
The Site Tour will start at 10 AM, 8 July, 2005. Please come and gather at south exit of Aioi JR station. For more detail and registration, please mail to info@euva.or.jp

16^th EUVA Newsletter (April 2005)
16^th EUVA Newsletter is circulated to interested people and published on "Information warehouse for all" in the EUVA Community site. This issue highlights the report of SPIE 2005 held at San Jose. IEUVI (International EUV Initiative) and its four TWGs were convened in conjunction with SPIE and reported as well. NEDO held the mid-term project evaluation committee to investigate and evaluate EUVA project. EUVA Project will be evaluated on its project management, research results and future business plan. This issue conveys the formal decision by NEDO to extend EUVA Project Plan to March 2008.

EUVA has completed six mirrors projection optics of EUV exposure tool in April 2005.

EUVA has completed 1/3 scale model of projection optics. The model has also installed EUV mask and Si wafer on the stage. This will help people outside of EUV circle understand the structure of EUV projection optics with six Mo/Si multilayer mirrors and EUV light path. By clicking the picture, you can enjoy EUV light running through mirrors from mask to wafer.

[AVI file 1,597KB]

Dr. Naomichi Abe of EUVA received MEXT's commending.
Dr. Naomichi Abe, Director of Research Planning Department of EUVA, received an official commending from Minister of MEXT (Ministry of Education, Culture, Sports, Science and Technology) for his excellent work for resist development. He and his four colleagues of Fujitsu had worked to develop new high performance resist applicable to ArF Excimer Laser Lithography. May I propose you to wish him well for his future work?
15^th EUVA Newsletter (Feb. 2005)
15^th EUVA Newsletter is circulated to people interested and published on "Information warehouse for all" in the EUVA Community site. This issue has a news flash on DPP power of 19W at IF achieved at Gotemba Branch R&D Center of EUVA. Highlights are the report on the joint meeting of Source TWG and EUV Source Development committee held at TORAY training Center at Mishima, and the reports on Photonics West 2005, and conference of laser academy. It also conveys the extension of EUVA project for two years and its basic plan is under revision by NEDO.
14^th EUVA Newsletter (Dec. 2004)
14^th EUVA Newsletter is circulated and published on "Information warehouse for all" in the EUVA Community site. This issue highlights 12W at IF by DPP achieved at Gotemba Branch R&D Center of EUVA. 7kHz repetition rate of DPP generated 170W/2π at Plasma point and this means 12W power at IF, which easily exceeded intermediate goal of 10 W at the end of FY2005. Another topic is the report of 3rd EUVL Symposium held in Miyazaki. 417 people gathered and the conference hall was filled with feverish excitement because EUV light and tool had come in sight of commercial stage.
13^th EUVA Newsletter (Oct. 2004)
13^th EUVA Newsletter is circulated and published on "Information warehouse for all" in the EUVA Community site. This issue highlights world record of EUV light power generated by LPP at Hiratsuka R&D Center of EUVA. International Science and Technology Center (ISTC) in Russia organized ISTC Japan Workshop in October 1^st, gathering over 60 people. Lecturers from Russia research institutes gave presentaion on their research on EUV light source.
PC WEB has published an article on EUVL development on 22 October 2004.
The article describes present status of EUVL development with detailed technical commentary. The URL is as follows; http://pcweb.mycom.co.jp/articles/2004/10/22/euvl/
12^th EUVA Newsletter (Aug. 2004)
12^th EUVA Newsletter (Aug. 2004) is circulated and published on "Information warehouse for all" in the EUVA Community site. This issue highlights reports of several workshops and conferences; Next Generation Lithography Workshop 2004, SPIE, BEAMS 2004, and IEUVI. EUVA's basic R&D schedule will be changed from 4-year plan to 6-year plan from FY2002 to FY2007 provided that the budget for FY 2005 would be approved.
We will appreciate your advice or comments on EUVA Newsletter. Please send them to emaster@euva.or.jp Thank you.
Invitation to EUVA R&D Site Tour for the press
EUVA plans to invite the press to Hiratsuka R&D center and Sagamihara R&D Center on 25 August 2004. Hiratsuka Center is developing EUV LPP source and is expected to achieve 4W EUV power soon. Sagamihara Center is developing technologies on EUV exposure tool, including aspherical lens processing and wave front measurement.
Site Tour starts at 10 AM at Hiratsuka JR station and first visit Hiratsuka Center. After lunch break, tour will visit Sagamihara Center with bus. Tour will end at 4:30 PM at Sagami-Ono station of Odakyu Line. Please register your name and organization to info@euva.or.jp by 18 August 2004. Participation is free.
11^th EUVA Newsletter
11^th EUVA Newsletter is circulated and published on "Information warehouse for all" in the EUVA Community site. This issue highlights the EUVA Report on the research results in FY2003 held on 8 June at Kokuyo Hall in Tokyo. Other topics of this issue are; Report on Leading Project by MEXT held on 9 June in Tokyo, EIPBN 2004 on 2 -4 June at San Diego, and PMC 2004 on 23-26 May at SF.
We will appreciate your advice or comments on EUVA Newsletter. Please send them to emaster@euva.or.jp Thank you.
2^nd EUVA Report
2^nd EUVA Report will be held on 8 June at Kokuyo-Hall, near JR Shinagawa station.
The detail will be announced soon on this EUVA official site.
10^th EUVA Newsletter
10^th EUVA Newsletter is circulated and published on "Information warehouse for all" in the EUVA Community site. This issue highlights the SPIE Microlithography Forum held on 22-27 February at Santa Clara, USA. Other topics covered by this issue are IEUVI meeting held in conjunction with SPIE and PICALO2004 held in Melbourne, Australia.
We will appreciate your advice or comments on EUVA Newsletter. Please send them to emaster@euva.or.jp Thank you.
9^th EUVA Newsletter is published
9^th EUVA Newsletter is circulated and published on "Information warehouse for all" in the EUVA Community site. This issue highlights latest topics presented at Lithography Forum held in February 2004 in LA, USA. ArF-Immersion technology is attracting lithography people as a possible method for 65nm and even 45nm hp.
Another topic is the result of first evaluation on EUV source, which has selected two methods for LPP and a merged method for DPP.
We will appreciate your advice or comments on EUVA Newsletter. Please send them to emaster@euva.or.jp Thank you.
Nikon to Start Full-Scale Product Development of EUVL System
Nikon Corporation announced on January 14, 2004, that it sees no major hurdles to block the development of Extreme Ultraviolet Lithography (EUVL) systems and will start full-scale product development in 2004, with the planned launch for the system by 2006.
The tool is targeted at mass production of 45 nm DRAMs and 32 nm microprocessors.
For further information, contact: Bernie Wood, Director of Marketing, Nikon Precision Inc.,
(650) 413-8533 phone, bwood@nikon.com
8^th EUVA Newsletter is circulated and published on "Information warehouse for all" in the EUVA Community site. This issue highlights a report on discussion meeting of EUV source held on 28-29 November at Toray Training Center in Mishima, which gathered over 40 researchers from EUVA and Leading project. At the meeting EUVA Hitratsuka reported that 4 watts output at plasma point has been achieved using LPP system. The 8^th Newsletter has been uploaded at "Information warehouse for all" in the EUVA Community site.
We will appreciate your advice or comments on EUVA Newsletter.
7^th EUVA Newsletter is published
7^th EUVA Newsletter is circulated and published on "Information warehouse for all" in the EUVA Community site. This issue highlights latest topics presented at 2^nd EUVL Symposium held 30^th Sept. to 3^rd Oct. at Antwerp in Belgium. Another topic is an interview with Mr. Katsusada Hirose, former vice minister of METI and incumbent governor of Oita prefecture. He had used his influence to organize EUVA project at METI.
We will appreciate your advice or comments on EUVA Newsletter. Please send them to emaster@euva.or.jp Thank you.
6^th EUVA Newsletter
The 6^th edition has been uploaded in the "EUVA Information warehouse for all" at the EUVA Community site. Its main topic is the research report on Russian institutes developing EUVL technologies. You can download all EUVA Newsletters from the EUVA community site. Your comment is welcome, Please send them to emaster@euva.or.jp.
EUVA site tour by the press
EUVA invited press people to the EUVA Hiratsuka and Gotemba R&D Center on 31 July. Seven people from the press joined the tour. Hiratsuka R&D Center explained LPP light source development showing the latest data. Then they visited the clean room where lasers and Xe target system was constructed to produce LPP light. They took one-hour bus ride from Hiratsuka to Gotemba and visited DPP R&D site. Researchers showed data of DPP light which achieved 6W output recently. One-day site tour was very informative through site visit and discussions. The tour concluded at JR Mishima station at 4:30PM.
5^th EUVA Newsletter
The 5^th edition has been uploaded in the "EUVA Information warehouse for all" at the EUVA Community site. Its main topic is the first EUVA Report on the results of FY 2002 R&D. Dr. Gargini, Intel fellow, made a special speech on the International EUV Initiative after the Report seminar and this is also included in the 5^th EUVA Newsletter. You can download all EUVA Newsletters for the community site. Your comment is welcome , please send them to emaster@euva.or.jp.
3^rd and 4^th EUVA Newsletter
These latest editions have been uploaded in the EUVA Information warehouse for all at the EUVA Community site, as you know.
You can download all EUVA Newsletters for the community site. Your comments will be appreciated, please send them to emaster@euva.or.jp.
1^st EUVA General Meeting
The general meeting was held on 21 May 2003 at Palace Hotel in Tokyo and it has approved FY2002 budget and expenditure, management report. 7^th Board of Directors meeting, which was held immediately after the general meeting decided new chairman, president and executive director. New directors of EUVA are listed at Organizational structure of EUVA in the EUVA Official site.
New Office - Putting new wine into new bottles -
EUVA moves to a new office near the imperial palace from 1 June 2003.
New office is easy location for people using subways. The nearest subway station is Takebashi of Tozai-Line. Jinbo-cho of Toei-Line, Awaji-cho of Marunouchi-Line, Kanda of JR are also within 10 minutes walk from the office.
This building is the first one adopted controlled vibration system, which uses two active weights moving opposite directions of waves.
If you are interested in, you can find more at
http://www.kajima.co.jp/tech/seishin_menshin/jisseki/bt-active.html
2nd edition of EUVA Newsletter is published
The 2nd edition of EUVA Newsletter is published on 26 December 2002.
If you would like to subscribe it, please send your request to emaster@euva.or.jp , but please take note that the language used is Japanese.
Your input to the news is of course welcome,
NEDO Workshop on "Key Technology accelerating IT home apparatus and mobile computing" was held on 14 January 2003 at Kouku-Kaikan near JR Shinbashi Station. Two sessions were simultaneously held, one for digital home apparatus, and the other for semiconductor related technology. The lectures for the latter session included semiconductor application chip for server, that for memory, and latest environment of LSI designing. Public comments are accepted at the URL of http://www.symponet.com/it_workshop/
Report on "nano-technology creating new industries - n-Plan2002-"
Keidanren has released its policy proposal on the promotion of nano-technology development on 19 November 2002.
Keidanren published a policy proposal titled as "Nano-technology, developing 21^st century" in July 2000, in which Keidanren indicated its basic concept for strengthen nano-technology development. In March, it made a report of "The future society composed of nano-technology, - n-Plan21-", in which the idea of Japanese industry was revealed on the critical areas of R&D, mainly dealt by Government and the social structure which should be changed to promote R&D. This report issued on 19 November 2002, is concluded after deliberate discussions and revised from the former report on the nano-technology. EUV lithography is described in the section of next generation semiconductor industry in the area of focused investment.
You can download the report from EUVA Community Site (http://galaxy.euva.or.jp/).
1^st edition of EUVA Newsletter is published The first edition of EUVA Newsletter is published on 1 November 2002. It ahs a plenty of news on EUVL and EUVA. If you would like to subscribe it, please send your e-mail to emaster@euva.or.jp
Your input to the news will be welcome, but please take note that the language used is Japanese.
EUVA celebrated its inauguration and held a party at Club Kanto on 11 July 2002. Mr. Ushio, EUVA Chair, welcomed over 130 people to the party including high profile figures; Mr. Omi, Minister for Science and Technology (at the time), Mr. Furuya, vice Minister of METI.
EUVA has started its operation from June 2002. Its office is located at Iwamoto-cho, in Tokyo. Iwamoto-cho is near to Akihabara which is famous to high geeks seeking PCs and electronic parts. Around the office, there are many wholesalers, for example, hardware, textile, and bottles. Scenes of streets give us historical taste of Tokyo. Small fish shop or meat shop is wedged between wholesales shop and the shop owner gives us warm greetings every time we pass by.