Forum to disseminate the results

  1. EUVA Report on the development of EUV source from 2008 to 2010
    The EUVA report to disseminate EUVA's research results on the development of EUV source from FY 2008 to FY2010 will be held on 18 March 2011 at the "Mirai-Kan," the National Museum of Emerging Science and Innovation at Oume, Koto-ku, Tokyo.
    The National Museum of Emerging Science and Innovation is located at 2-3-6 Oume, Koto-ku, Tokyo.
    Please apply to EUVA for your attendance.

  2. The fifth EUVA Report
    The fifth EUVA report to disseminate EUVA's research results in FY2006 will be held on 30 May 2007 at the Tokyo National Museum at Ueno. The report will be managed by EUVA in cooperation with ASET and Selete. In conjunction with EUVA results, ASET EUV research group will present their final report since their research was concluded in March 2007. Selete will report on its EUV program started from FY 2006. Leading Project group will also present their research results on EUV source. Please refer to the program.

    The Tokyo National Museum is located in the Ueno Park, and you are surely surprised to its solemnity and exudation of Japanese tradition. The venue of EUVA Report is "Heisei Kan" and you might also enjoy other facilities and study Japanese history.
    Address: 13-9 Ueno Park,Taito-ku, Tokyo,110-8712, Japan
    Please apply to EUVA for your attendance.

  3. The fourth EUVA report to disseminate EUVA's research results in FY2005 will be held on 13 June 2006 at the Kokuyo Hall. Dr. Hisatsune Watanabe, President of Selete, will give a keynote speech. Please refer to the program.
    The Kokuyo Hall is located near to the Kounan exit (east exit) of JR Shinagawa station, which is the same venue the previous EUVA reports were held.
    Address: 1-8-35 Kounan, Minato-ku, Tokyo
    TEL: 03-3450-3712
    Admission is free and please apply to Ms. Chiba, info@euva.or.jp for your attendance.

  4. The third EUVA report to disseminate EUVA's research results in FY2004 will be held on 7 June 2005 at the Kokuyo Hall.
    The Kokuyo Hall is located near to the Kounan exit (east exit) of JR Shinagawa station, which is the same venue the previous EUVA reports were held.
    Address: 1-8-35 Kounan, Minato-ku, Tokyo
    TEL: 03-3450-3712
    Admission is free and please register your name to Ms. Chiba, info@euva.or.jp
    3rd EUVA Report Program

  5. Report on the FY2003 research results of Leading Project by MEXT
    The report will be made at 10:00AM on 9 June 2004, at the National Museum of Emerging Science and Innovation. Leading Project has started from FY 2003 for five-year project under the support of MEXT. Osaka University is coordinating the Project with more than ten universities and research institutes. The Project aims to commercialise EUV light source using laser technologies with physical analysis of EUV plasma. Recently Osaka University achieved 3% efficiency of EUV light radiation with thin Sn target.
    Pleas contact "fyamamo@ile.osaka-u.ac.jp" for more detail.

  6. The second EUVA report to disseminate EUVA's research results during FY2003 will be held on 8 June 2004 at the Kokuyo Hall.
    The Kokuyo Hall is located near to the Kounan exit (east exit) of JR Shinagawa station, which is the same venue the first EUVA report was held.
    Address: 1-8-35 Kounan, Minato-ku, Tokyo
    TEL: 03-3450-3712
    Admission is free and please register your name to Ms. Chiba, info@euva.or.jp
    2nd EUVA Report Program

  7. Second EUVL Symposium: September 2003, in Antwerp.
    EUVA presented papers on its R&D results at 2nd EUVL Symposium held 30th September to 2nd October at Antwerp, Belgium.
    Oral presentations;
    -   "Laser-Produced-Plasma Light Source Development for EUV Lithography at EUVA," by Akira Endo
    -   "Study of ion damage on EUV light source collector mirrors," by Hiroshi Komori
    Poster presentations;
    -   "Evaluation of Contamination Deposition on Pinholes Used in EUV Wavefront Metrology," by K. Sugisaki et al., EUVA and M. Niibe, Himeji Institute of Technology
    -   "Recent Advances of the Visible Point Diffraction Interferometer for EUVL Aspheric Mirrors," by K. Otaki, et al.
    -   "Radiation Characteristics of a Cappilarry Z-pinch EUV Source," by Yusuke Teramoto, et al.

    AIST made an oral presentation;
    "Progress of tin plasma technologies at AIST," by Toshihisa Tomie

  8. The first EUVA Report to disseminate EUVA's research results during FY2002 was held on 10 June 2003. It gathered 243 people from industry, research institute, government and press. Immediately after the Report, Dr. Gargini, Intel fellow, gave a special speech on the trends of EUV development and the outline of International EUV Initiative (IEUVI). Mr. Takahashi, the executive director at NEDO, made an opening speech at the evening party, saying the R&D on EUVL is a challenging one which looks like to let a locomotive run while laying rails ahead of it.
    The paper presented by Dr. Tadashi Nishimura, Renesas Corp., was uploaded at EUVA Information Warehouse for All in the EUVA Community Site,

  9. The first EUVA seminar to disseminate EUVA's research results during FY2002 will be held on 10 June 2003 at the Kokuyo Hall.
    The Kokuyo Hall is located near to the Kounan exit (east exit) of JR Shinagawa station.
    Address: 1-8-35 Kounan, Minato-ku, Tokyo
    TEL: 03-3450-3712
    Admission is free and please register your name to Ms. Chiba, info@euva.or.jp
    EUVA Report Program

  10. 4th International Symposium on Laser Precision Microfabrication (LPM 2003)

    The 4th International Symposium on Laser Precision Microfabrication is due to take place from June 21st to 24th, 2003, at the New Trade Fair Munich. Also, Laser 2003: World of Photonics,, one of the largest international trade shows in lasers and optics, takes place on the same ground form June 23rd to 26th.

    The LPM 2003 focuses on reporting and discussing progress in the field of lasers and their applications in precision microfabrication. Topics to be covered are:
    - fundamentals of laser-material interaction in micro-/nanomachining
    - modeling and simulation
    - ultla-short pulsed laser processing
    - UV, VUV and EUV sources and applications
    And Special Session on EUV Lithography will be held in conjunction with the Symposium.