EUVA Selete 29-31 October, 2007 Sapporo Convention Center, Sapporo, JAPAN
2007 International EUVL Symposium
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 Program

[講演トピックス]

- Exposure Tools (ET)
- Source (SO)
- Mask (MA)
- Defect Inspection (DI)
- Reticle Protection (RP)
- Metrology (ME)
- Sensors & Diagnostics (SD)
- Multilayer Coatings (MC)
- Contamination & Cleanliness (CC)
- Optics (OP)
- Resist (RE)
- Cost of Ownership (CO)

AGENDA

Sunday, 28 October
16:00 - 20:30     Early Registration and Speaker Prep
18:00 - 20:00 Welcome Reception
[札幌コンベンションセンター中ホールにて(サキソフォン ソロ)]
19:00 - 21:00 EUVL Steering Committee Dinner Meeting (invitation only)
 
Monday, 29 October
07:30 - 13:00 Poster Setup
08:30 - 12:30 General Session
「Toshiba's Strategy in Semiconductor Business and Production Technology」
12:30 - 13:30 Lunch
13:30 - 17:00 General Session
17:00 - 18:30 Poster Session
19:00 - 21:00 EUVL Symposium Welcome Dinner
[ルネッサンスサッポロホテルにて(バイオリン&アコーディオン デュオ)]
 
Tuesday, 30 October
08:30 - 12:40 General Session
「EUV Lithography: Issues and Future Prospects」
12:40 - 13:40 Lunch
13:40 - 15:00 Poster Session
15:00 - 17:00 Posters Removed (all posters must be removed by 17:00)
 
Wednesday, 31 October
07:00 - 08:00 EUVL Steering Committee Breakfast Meeting (Invitation only)
08:30 - 12:30 General Session
12:30 - 13:30 Lunch
13:30 - 17:40 General Session
18:30 - 20:30 Casual Dinner
[サッポロビール園にて(ジャズピアノ/パーカッションバンド)]
※ アジェンダの詳細は、以下のSEMATECH Webにてご確認下さい。
http://www.sematech.org/meetings/announcements/8059/program.htm
 
The following meetings will be held in conjunction with the EUVL Symposium. Note that a separate registration form is required for each meeting. Announcements for these meetings will go out at a later date:
 
Thursday, 1 November
IEUVI Mask TWG (Invitation Only)
IEUVI Resist TWG (Invitation Only)
IEUVI Source TWG (Invitation Only)
IEUVI Optics Lifetime/Contamination TWG (Invitation Only)
 
Friday, 2 November
IEUVI Meeting (Invitation Only)

Copyright  (C) 2007 EUVL All Rights Reserved.